{"315991":{"#nid":"315991","#data":{"type":"event","title":"IEN Technical Seminar on Advanced Fabrication: Plasma Processing of Thin Films: Part II with Professor Dennis Hess","body":[{"value":"\u003Cp\u003E\u003Cstrong\u003EAbstract:\u003C\/strong\u003E Fabrication of devices and structures for integrated circuits, sensors, photonics, and MEMS\/NEMS requires layers of patterned thin films.\u0026nbsp; For nearly all film materials, patterns are generated by lithographic processes, followed by plasma etching.\u0026nbsp; Plasmas or glow discharges are ionized gases that contain electrons, ions, neutral species and photons that promote chemical reactions and ensure that anisotropic etch profiles can be obtained.\u0026nbsp; This tutorial will discuss the fundamental physics and chemistry of plasmas, plasma reactor configurations, unique properties of plasmas that allow thin film processing for a variety of applications, and approaches to control etch rates, profiles, and etch selectivity.\u003C\/p\u003E\u003Cp\u003E\u003Cstrong\u003EBio:\u003C\/strong\u003E Dennis W. Hess is the Thomas C. DeLoach Jr., Professor of Chemical and Biomolecular Engineering at the Georgia Institute of Technology.\u0026nbsp; His research interests include thin films, surfaces, and interfaces, especially as applied to microelectronics and polymer processing.\u0026nbsp; He received a B.S. in Chemistry from Albright College, and M.S. and Ph.D. degrees in Physical Chemistry from Lehigh University.\u0026nbsp; He was a Member of the Research Staff and Supervisor of Process Development at Fairchild Semiconductor from 1973 to 1977.\u0026nbsp; From 1977 to 1991 he was a faculty member in the Chemical Engineering Department at the University of California, Berkeley, where he also served as Assistant Dean, College of Chemistry (1982-1987) and Vice Chair, ChE Department (1988-1991).\u0026nbsp; From 1991-1996, he served as Chair of the Chemical Engineering Department at Lehigh University.\u0026nbsp; He joined the School of Chemical \u0026amp; Biomolecular Engineering at Georgia Tech in 1996. \u0026nbsp;\u003C\/p\u003E","summary":null,"format":"limited_html"}],"field_subtitle":"","field_summary":"","field_summary_sentence":[{"value":"Please join us for the conclusion of a dual lecture series on plasma enhanced deposition and etching with Professor Dennis Hess of the School of Chemical and Biomolecular Engineering at Georgia Tech."}],"uid":"27863","created_gmt":"2014-08-15 12:10:39","changed_gmt":"2017-04-13 21:22:03","author":"Christa Ernst","boilerplate_text":"","field_publication":"","field_article_url":"","field_event_time":{"event_time_start":"2014-09-04T13:00:00-04:00","event_time_end":"2014-09-04T14:00:00-04:00","event_time_end_last":"2014-09-04T14:00:00-04:00","gmt_time_start":"2014-09-04 17:00:00","gmt_time_end":"2014-09-04 18:00:00","gmt_time_end_last":"2014-09-04 18:00:00","rrule":null,"timezone":"America\/New_York"},"extras":["free_food"],"hg_media":{"315971":{"id":"315971","type":"image","title":"Dr.  Dennis Hess","body":null,"created":"1449244947","gmt_created":"2015-12-04 16:02:27","changed":"1475895024","gmt_changed":"2016-10-08 02:50:24","alt":"Dr.  Dennis Hess","file":{"fid":"201761","name":"hess_pasper.jpg","image_path":"\/sites\/default\/files\/images\/hess_pasper_0.jpg","image_full_path":"http:\/\/tlwarc.hg.gatech.edu\/\/sites\/default\/files\/images\/hess_pasper_0.jpg","mime":"image\/jpeg","size":275478,"path_740":"http:\/\/tlwarc.hg.gatech.edu\/sites\/default\/files\/styles\/740xx_scale\/public\/images\/hess_pasper_0.jpg?itok=6Qrkbhf4"}}},"media_ids":["315971"],"groups":[{"id":"1271","name":"NanoTECH"},{"id":"197261","name":"Institute for Electronics and Nanotechnology"},{"id":"198081","name":"Georgia Electronic Design Center (GEDC)"},{"id":"213771","name":"The Center for MEMS and Microsystems Technologies"},{"id":"213791","name":"3D Systems Packaging Research Center"}],"categories":[],"keywords":[{"id":"42511","name":"Dennis Hess"},{"id":"99961","name":"Electrochemical Processes"},{"id":"12701","name":"Institute for Electronics and Nanotechnology"},{"id":"99981","name":"plasma deposition and plating"}],"core_research_areas":[],"news_room_topics":[],"event_categories":[{"id":"1795","name":"Seminar\/Lecture\/Colloquium"}],"invited_audience":[{"id":"78751","name":"Undergraduate students"},{"id":"78761","name":"Faculty\/Staff"},{"id":"78771","name":"Public"},{"id":"174045","name":"Graduate students"}],"affiliations":[],"classification":[],"areas_of_expertise":[],"news_and_recent_appearances":[],"phone":[],"contact":[{"value":"\u003Cp\u003EHang Chen at \u003Ca href=\u0022mailto:hang.chen@ien.gatech.edu\u0022\u003Ehang.chen@ien.gatech.edu\u003C\/a\u003E\u003C\/p\u003E","format":"limited_html"}],"email":[],"slides":[],"orientation":[],"userdata":""}}}